| Properties of AlN grown by plasma enhanced atomic layer deposition M Bosund, T Sajavaara, M Laitinen, T Huhtio, M Putkonen, VM Airaksinen, ... Applied Surface Science 257 (17), 7827-7830, 2011 | 152 | 2011 |
| Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors M Putkonen, M Bosund, OME Ylivaara, RL Puurunen, L Kilpi, ... Thin Solid Films 558, 93-98, 2014 | 91 | 2014 |
| GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride M Bosund, P Mattila, A Aierken, T Hakkarainen, H Koskenvaara, ... Applied Surface Science 256 (24), 7434-7437, 2010 | 61 | 2010 |
| Atomic layer deposited TiO2 films in photodegradation of aqueous salicylic acid S Vilhunen, M Bosund, ML Kääriäinen, D Cameron, M Sillanpää Separation and Purification Technology 66 (1), 130-134, 2009 | 60 | 2009 |
| Atomic Layer Deposition Al2O3 Coatings Significantly Improve Thermal, Chemical, and Mechanical Stability of Anodic TiO2 Nanotube Layers R Zazpe, J Prikryl, V Gärtnerova, K Nechvilova, L Benes, L Strizik, ... Langmuir 33 (13), 3208-3216, 2017 | 55 | 2017 |
| Ytterbium-doped fibers fabricated with atomic layer deposition method JJM i Ponsoda, L Norin, C Ye, M Bosund, MJ Söderlund, A Tervonen, ... Optics Express 20 (22), 25085-25095, 2012 | 42 | 2012 |
| Nonlinear fitness–space–structure adaptation and principal component analysis in genetic algorithms: an application to x-ray reflectivity analysis J Tiilikainen, JM Tilli, V Bosund, M Mattila, T Hakkarainen, VM Airaksinen, ... Journal of Physics D: Applied Physics 40 (1), 215, 2006 | 31 | 2006 |
| HOR activity of Pt-TiO2-Y at unconventionally high potentials explained: the influence of SMSI on the electrochemical behavior of Pt TN Geppert, M Bosund, M Putkonen, BM Stühmeier, AT Pasanen, ... Journal of The Electrochemical Society 167 (8), 084517, 2020 | 29 | 2020 |
| Atomic layer deposition of ytterbium oxide using β-diketonate and ozone precursors M Bosund, K Mizohata, T Hakkarainen, M Putkonen, M Söderlund, ... Applied surface science 256 (3), 847-851, 2009 | 29 | 2009 |
| Genetic algorithm using independent component analysis in x-ray reflectivity curve fitting of periodic layer structures J Tiilikainen, V Bosund, JM Tilli, J Sormunen, M Mattila, T Hakkarainen, ... Journal of Physics D: Applied Physics 40 (19), 6000, 2007 | 29 | 2007 |
| Passivation of GaAs surface by atomic-layer-deposited titanium nitride M Bosund, A Aierken, J Tiilikainen, T Hakkarainen, H Lipsanen Applied surface science 254 (17), 5385-5389, 2008 | 26 | 2008 |
| Effect of growth temperature on the epitaxial growth of ZnO on GaN by ALD S Särkijärvi, S Sintonen, F Tuomisto, M Bosund, S Suihkonen, H Lipsanen Journal of crystal growth 398, 18-22, 2014 | 24 | 2014 |
| Accuracy in x-ray reflectivity analysis J Tiilikainen, JM Tilli, V Bosund, M Mattila, T Hakkarainen, J Sormunen, ... Journal of Physics D: Applied Physics 40 (23), 7497, 2007 | 23 | 2007 |
| High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning H Jussila, P Mattila, J Oksanen, A Perros, J Riikonen, M Bosund, ... Applied Physics Letters 100 (7), 2012 | 22 | 2012 |
| Fitness function and nonunique solutions in x-ray reflectivity curve fitting: crosserror between surface roughness and mass density J Tiilikainen, V Bosund, M Mattila, T Hakkarainen, J Sormunen, ... Journal of Physics D: Applied Physics 40 (14), 4259, 2007 | 22 | 2007 |
| Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas A Perros, M Bosund, T Sajavaara, M Laitinen, L Sainiemi, T Huhtio, ... Journal of Vacuum Science & Technology A 30 (1), 2012 | 15 | 2012 |
| Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition P Mattila, M Bosund, T Huhtio, H Lipsanen, M Sopanen Journal of Applied Physics 111 (6), 2012 | 13 | 2012 |
| ATOMIC LAYER DEPOSITION HfO2 FILM USED AS BUFFER LAYER OF THE Pt/(Bi0.95Nd0.05)(Fe0.95Mn0.05)O3/HfO2/Si CAPACITORS FOR FeFET … DAN XIE, T FENG, Y LUO, X Han, T REN, M Bosund, S LI, VM Airaksinen, ... Journal of Advanced Dielectrics 1 (03), 369-377, 2011 | 9 | 2011 |
| Tribological properties of thin films made by atomic layer deposition sliding against silicon L Kilpi, OME Ylivaara, A Vaajoki, X Liu, V Rontu, S Sintonen, E Haimi, ... Journal of Vacuum Science & Technology A 36 (1), 2018 | 7 | 2018 |
| Comparative study and characterization of atomic layer deposition Al2O3 films as metal-insulator-metal capacitor dielectric for GaAs hetero-junction bipolar transistor technology J Yota, M Janani, HM Banbrook, P Rabinzohn, M Bosund Journal of Vacuum Science & Technology A 37 (5), 2019 | 6 | 2019 |
