| Study of dc micro-discharge arrays made in silicon using CMOS compatible technology MK Kulsreshath, L Schwaederle, LJ Overzet, P Lefaucheux, J Ladroue, ... Journal of Physics D: Applied Physics 45 (28), 285202, 2012 | 28 | 2012 |
| MEMS packaging process by film transfer using an anti-adhesive layer S Brault, O Garel, G Schelcher, N Isac, F Parrain, A Bosseboeuf, F Verjus, ... Microsystem technologies 16 (7), 1277-1284, 2010 | 21 | 2010 |
| Modeling and characterization of MicroPirani vacuum gauges manufactured by a low-temperature film transfer process G Schelcher, F Fabbri, E Lefeuvre, S Brault, P Coste, E Dufour-Gergam, ... Journal of microelectromechanical systems 20 (5), 1184-1191, 2011 | 19 | 2011 |
| Cyclic olefin copolymer plasma millireactors G Schelcher, C Guyon, S Ognier, S Cavadias, E Martinez, V Taniga, ... Lab on a Chip 14 (16), 3037-3042, 2014 | 17 | 2014 |
| Mechanical resistance of patterned BCB bonded joints for MEMS packaging C Cuminatto, M Braccini, G Schelcher, G Parry, F Parrain Microelectronic engineering 111, 39-44, 2013 | 15 | 2013 |
| Designing Hydrophobicity of the PLA Polymer Blend Surfaces by ICP Etching D Vrsaljko, I Grcic, C Guyon, G Schelcher, M Tatoulian Plasma Processes and Polymers, 2016 | 13 | 2016 |
| Silver nanocluster catalytic microreactors for water purification B Da Silva, M Habibi, S Ognier, G Schelcher, J Mostafavi-Amjad, ... The European Physical Journal Special Topics 225 (4), 707-714, 2016 | 11 | 2016 |
| Study of the Stability and Hydrophilicity of Plasma‐Modified Microfluidic Materials B Da Silva, M Zhang, G Schelcher, L Winter, C Guyon, P Tabeling, ... Plasma Processes and Polymers 14 (3), 1600034, 2017 | 9 | 2017 |
| Le transfert de films: vers une intégration hétérogène des micro et nanosystèmes G Schelcher Paris 11, 2012 | 8 | 2012 |
| MEMS process by film transfer using a fluorocarbon anti-adhesive layer G Schelcher, S Brault, F Parrain, E Lefeuvre, E Dufour-Gergam, ... Journal of The Electrochemical Society 158 (5), H545, 2011 | 8 | 2011 |
| Machine learning for predictive electrical performance using OCD S Das, J Hung, S Halder, G Schelcher, R Koret, I Turovets, M Saib, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 4 | 2019 |
| Co-optimization of exposure dose and etch process for SAQP pitch walk control MJ Maslow, V Timoshkov, T Kiers, TK Jee, L Reijnen, K Kumar, ... Optical Microlithography XXXI 10587, 1058704, 2018 | 2 | 2018 |
| Micro Pirani vacuum gauges manufactured by a film transfer process G Schelcher, E Lefeuvre, S Brault, F Parrain, E Martincic, ... Procedia Engineering 5, 1136-1139, 2010 | 2 | 2010 |
| Electrical validation of massive E-beam defect metrology in EUV-patterned interconnects N Kissoon, E De Poortere, D Hellin, S Decoster, G Murdoch, S Lariviere, ... Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | | 2021 |
| Machine learning for predictive electrical performance using OCD (Erratum) S Das, J Hung, S Halder, G Schelcher, R Koret, I Turovets, M Saib, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | | 2019 |
| Voltage contrast edge placement estimation for overlay, CD, and local uniformity metrology (Conference Presentation) CE Tabery, V Rutigliani, S Hastings, E de Poortere, L Wang, P Leray, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | | 2019 |
| Cyclic Olefin Copolymer Plasma Millireactors PTMT G. Schelcher, E. Martinez, B. Da Silva, C. Guyon, S. Ognier, S ... 13th International Conference on Microreaction Technology, 2014 | | 2014 |
| Cyclic Olefin Copolymer Plasma Millireactors PTMT G. Schelcher, E. Martinez, S. Ognier, L. Malaquin 1st International Conference on MICRO & NANOFLUIDICS Fundamentals and …, 2014 | | 2014 |
| A new microplasma reactor for the decomposition of Volatile Organic Compounds using a combination of dielectric barrier discharges with cobalt based catalyst MT G. Schelcher, B. Da Silva, C. Guyon, S. Cavadias,S IVC-19 2013, 2013 | | 2013 |
| Atmospheric pressure plasma-catalytic microsystems MT G. Schelcher, B. Da Silva, C. Guyon, S. Ognier, S Thermec 2013, 2-6 december, Las Vegas USA, 2013 | | 2013 |
Elie LefeuvreProfessor at University of Paris-Saclay, C2N Lab., Palaiseau, FranceVerified email at universite-paris-saclay.fr
