| Study of dc micro-discharge arrays made in silicon using CMOS compatible technology MK Kulsreshath, L Schwaederle, LJ Overzet, P Lefaucheux, J Ladroue, ... Journal of Physics D: Applied Physics 45 (28), 285202, 2012 | 27 | 2012 |
| MEMS packaging process by film transfer using an anti-adhesive layer S Brault, O Garel, G Schelcher, N Isac, F Parrain, A Bosseboeuf, F Verjus, ... Microsystem technologies 16, 1277-1284, 2010 | 23 | 2010 |
| Cyclic olefin copolymer plasma millireactors G Schelcher, C Guyon, S Ognier, S Cavadias, E Martinez, V Taniga, ... Lab on a Chip 14 (16), 3037-3042, 2014 | 20 | 2014 |
| Modeling and characterization of MicroPirani vacuum gauges manufactured by a low-temperature film transfer process G Schelcher, F Fabbri, E Lefeuvre, S Brault, P Coste, E Dufour-Gergam, ... Journal of microelectromechanical systems 20 (5), 1184-1191, 2011 | 19 | 2011 |
| Designing Hydrophobicity of the PLA Polymer Blend Surfaces by ICP Etching D Vrsaljko, I Grcic, C Guyon, G Schelcher, M Tatoulian Plasma Processes and Polymers, 2016 | 16 | 2016 |
| Mechanical resistance of patterned BCB bonded joints for MEMS packaging C Cuminatto, M Braccini, G Schelcher, G Parry, F Parrain Microelectronic engineering 111, 39-44, 2013 | 16 | 2013 |
| Silver nanocluster catalytic microreactors for water purification B Da Silva, M Habibi, S Ognier, G Schelcher, J Mostafavi-Amjad, ... The European Physical Journal Special Topics 225, 707-714, 2016 | 14 | 2016 |
| Study of the Stability and Hydrophilicity of Plasma‐Modified Microfluidic Materials B Da Silva, M Zhang, G Schelcher, L Winter, C Guyon, P Tabeling, ... Plasma Processes and Polymers 14 (3), 1600034, 2017 | 10 | 2017 |
| Le transfert de films: vers une intégration hétérogène des micro et nanosystèmes G Schelcher Paris 11, 2012 | 9 | 2012 |
| MEMS process by film transfer using a fluorocarbon anti-adhesive layer G Schelcher, S Brault, F Parrain, E Lefeuvre, E Dufour-Gergam, ... Journal of The Electrochemical Society 158 (5), H545, 2011 | 8 | 2011 |
| Machine learning for predictive electrical performance using OCD S Das, J Hung, S Halder, G Schelcher, R Koret, I Turovets, M Saib, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 5 | 2019 |
| Voltage contrast edge placement estimation for overlay, CD, and local uniformity metrology (Conference Presentation) CE Tabery, V Rutigliani, S Hastings, E de Poortere, L Wang, P Leray, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 5 | 2019 |
| Micro Pirani vacuum gauges manufactured by a film transfer process G Schelcher, E Lefeuvre, S Brault, F Parrain, E Martincic, ... Procedia Engineering 5, 1136-1139, 2010 | 4 | 2010 |
| Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE R Anunciado, J Lee, E Barzegar, S van der Sanden, G Schelcher, ... International Conference on Extreme Ultraviolet Lithography 2022 12292, 150-157, 2022 | 3 | 2022 |
| Co-optimization of exposure dose and etch process for SAQP pitch walk control MJ Maslow, V Timoshkov, T Kiers, TK Jee, L Reijnen, K Kumar, ... Optical Microlithography XXXI 10587, 11-24, 2018 | 2 | 2018 |
| Feature grouping to enable edge placement error-aware process control in multi-feature logic use case G Schelcher, M Athayde, S Schoofs, J Hsia, Z Khalik, F Li, K Nechaev, ... Metrology, Inspection, and Process Control XXXVIII 12955, 135-145, 2024 | | 2024 |
| Feature grouping to enable edge placement error-aware process control in multi-feature logic use case PL Guillaume Schelcher, Marsil Athayde, Stijn Schoofs, Jeff Hsia, Zuan ... SPIE ALP 2024 12955, 2024 | | 2024 |
| E-test validation of space error budget and metrology EP De Poortere, N Kissoon, Y Zhang, C Tabery, J Mulkens, M McManus, ... | | 2022 |
| E-Test Validation of Space Error Budget and Metrology G Schelcher, EP De Poortere, N Kissoon, S Paolillo, MAC e Silva, ... IEEE Transactions on Semiconductor Manufacturing 35 (3), 478-484, 2022 | | 2022 |
| Electrical validation of massive E-beam defect metrology in EUV-patterned interconnects N Kissoon, E De Poortere, D Hellin, S Decoster, G Murdoch, S Lariviere, ... Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | | 2021 |
Elie LefeuvreProfessor at University of Paris-Saclay, C2N Lab., Palaiseau, FranceVerified email at universite-paris-saclay.fr
