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Nathan Marchack
Nathan Marchack
Staff Research Scientist, IBM TJ Watson Center
Verified email at us.ibm.com - Homepage
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Cited by
Year
STT-MRAM with double magnetic tunnel junctions
G Hu, JH Lee, JJ Nowak, JZ Sun, J Harms, A Annunziata, S Brown, ...
2015 IEEE International Electron Devices Meeting (IEDM), 26.3. 1-26.3. 4, 2015
932015
Structure and method to reduce shorting in STT-MRAM device
AJ Annunziata, GP Lauer, NP Marchack
US Patent 9,502,640, 2016
812016
Scalable nanostructured carbon electrode arrays for enhanced dopamine detection
S Demuru, L Nela, N Marchack, SJ Holmes, DB Farmer, GS Tulevski, ...
ACS sensors 3 (4), 799-805, 2018
622018
Perspectives in nanoscale plasma etching: what are the ultimate limits?
N Marchack, JP Chang
Journal of Physics D: Applied Physics 44 (17), 174011, 2011
512011
Spin-transfer torque MRAM with reliable 2 ns writing for last level cache applications
G Hu, JJ Nowak, MG Gottwald, SL Brown, B Doris, CP D’Emic, P Hashemi, ...
2019 IEEE International Electron Devices Meeting (IEDM), 2.6. 1-2.6. 4, 2019
502019
Area selective atomic layer deposition by microcontact printing with a water-soluble polymer
MN Mullings, HBR Lee, N Marchack, X Jiang, Z Chen, Y Gorlin, KP Lin, ...
Journal of The Electrochemical Society 157 (12), D600-D604, 2010
352010
Key parameters affecting STT-MRAM switching efficiency and improved device performance of 400° C-compatible p-MTJs
G Hu, MG Gottwald, Q He, JH Park, G Lauer, JJ Nowak, SL Brown, ...
2017 IEEE International Electron Devices Meeting (IEDM), 38.3. 1-38.3. 4, 2017
212017
Chemical processing of materials on silicon: more functionality, smaller features, and larger wafers
N Marchack, JP Chang
Annual review of chemical and biomolecular engineering 3, 235-262, 2012
202012
Plasma processing for advanced microelectronics beyond CMOS
N Marchack, L Buzi, DB Farmer, H Miyazoe, JM Papalia, H Yan, G Totir, ...
Journal of Applied Physics 130 (8), 2021
192021
Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes
H Miyazoe, N Marchack, RL Bruce, Y Zhu, M Nakamura, E Miller, ...
Journal of Vacuum Science & Technology B 36 (3), 2018
162018
Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications
N Marchack, H Miyazoe, RL Bruce, H Tsai, M Nakamura, T Suzuki, A Ito, ...
Journal of Vacuum Science & Technology B 36 (3), 2018
132018
Spin torque MRAM fabrication using negative tone lithography and ion beam etching
AJ Annunziata, AA Galan, S Holmes, EA Joseph, GP Lauer, Q Lin, ...
US Patent 9,705,077, 2017
132017
Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective
K Ishikawa, T Ishijima, T Shirafuji, S Armini, E Despiau-Pujo, RA Gottscho, ...
Japanese Journal of Applied Physics 58 (SE), SE0801, 2019
122019
Low-current spin transfer torque MRAM
G Hu, JJ Nowak, G Lauer, JH Lee, JZ Sun, J Harms, A Annunziata, ...
2017 International Symposium on VLSI Design, Automation and Test (VLSI-DAT), 1-2, 2017
122017
Monolithically integrated silicon photonic chip sensor for near-infrared trace-gas spectroscopy
EJ Zhang, Y Martin, JS Orcutt, C Xiong, M Glodde, N Marchack, EA Duch, ...
Chemical, Biological, Radiological, Nuclear, and Explosives (CBRNE) Sensing …, 2019
112019
Low degradation MRAM encapsulation process using silicon-rich silicon nitride film
AJ Annunziata, C Kothandaraman, GP Lauer, JH Lee, NP Marchack, ...
US Patent 9,515,252, 2016
102016
Control of surface oxide formation in plasma-enhanced quasiatomic layer etching of tantalum nitride
N Marchack, J Innocent-Dolor, M Hopstaken, S Engelmann
Journal of Vacuum Science & Technology A 38 (2), 2020
92020
Utilizing surface modification in plasma‐enhanced cyclic etching of tantalum nitride to surpass lithographic limits
N Marchack, K Hernandez, B Walusiak, J Innocent‐Dolor, S Engelmann
Plasma Processes and Polymers, e1900008, 2019
92019
Enhanced coercivity in MTJ devices by contact depth control
AJ Annunziata, GP Lauer, NP Marchack
US Patent 9,660,179, 2017
9*2017
Ultrahigh-Q on-chip silicon–germanium microresonators
R Schilling, C Xiong, S Kamlapurkar, A Falk, N Marchack, S Bedell, ...
Optica 9 (3), 284-287, 2022
82022
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