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Paul Chalker
Paul Chalker
Professor of Materials, University of Liverpool
Verified email at liv.ac.uk - Homepage
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Cited by
Year
The 2018 GaN power electronics roadmap
H Amano, Y Baines, E Beam, M Borga, T Bouchet, PR Chalker, M Charles, ...
Journal of Physics D: Applied Physics 51 (16), 163001, 2018
11662018
A review of the methods for the evaluation of coating-substrate adhesion
PR Chalker, SJ Bull, DS Rickerby
Materials Science and Engineering: A 140, 583-592, 1991
3421991
Embedded fibre Bragg grating sensors in advanced composite materials
KSC Kuang, R Kenny, MP Whelan, WJ Cantwell, PR Chalker
Composites Science and Technology 61 (10), 1379-1387, 2001
3212001
The identification and characterisation of mixed oxidation states at oxidised titanium surfaces by analysis of X-ray photoelectron spectra
AF Carley, PR Chalker, JC Riviere, MW Roberts
Journal of the Chemical Society, Faraday Transactions 1: Physical Chemistry …, 1987
2631987
Review on Non-Volatile Memory with High-k Dielectrics: Flash for Generation Beyond 32 nm
C Zhao, CZ Zhao, S Taylor, PR Chalker
Materials 7 (7), 5117-5145, 2014
1882014
Selective laser melting of high aspect ratio 3D nickel–titanium structures two way trained for MEMS applications
AT Clare, PR Chalker, S Davies, CJ Sutcliffe, S Tsopanos
International Journal of Mechanics and Materials in Design 4, 181-187, 2008
1822008
Novel mononuclear alkoxide precursors for the MOCVD of ZrO2 and HfO2 thin films
PA Williams, JL Roberts, AC Jones, PR Chalker, NL Tobin, JF Bickley, ...
Chemical Vapor Deposition 8 (4), 163-170, 2002
1412002
Properties of GaN nanowires grown by molecular beam epitaxy
L Geelhaar, C Cheze, B Jenichen, O Brandt, C Pfüller, S Münch, ...
IEEE Journal of Selected Topics in Quantum Electronics 17 (4), 878-888, 2011
1402011
Some recent developments in the chemical vapour deposition of electroceramic oxides
AC Jones, PR Chalker
Journal of Physics D: Applied Physics 36 (6), R80, 2003
1372003
Some recent developments in the MOCVD and ALD of high-κ dielectric oxides
AC Jones, HC Aspinall, PR Chalker, RJ Potter, K Kukli, A Rahtu, M Ritala, ...
Journal of Materials Chemistry 14 (21), 3101-3112, 2004
1312004
Chemical vapour deposition: precursors, processes and applications
M Ritala, H Parala, R Kanjolia, RD Dupuis, SE Alexandrov, SJC Irvine, ...
Royal Society of Chemistry, 2008
1272008
Photochemistry of refractive index structures in poly (methyl methacrylate) by femtosecond laser irradiation
A Baum, PJ Scully, M Basanta, CL Paul Thomas, PR Fielden, NJ Goddard, ...
Optics letters 32 (2), 190-192, 2006
1242006
Transition from electron accumulation to depletion at InGaN surfaces
TD Veal, PH Jefferson, LFJ Piper, CF McConville, TB Joyce, PR Chalker, ...
Applied Physics Letters 89 (20), 2006
1212006
Deposition of HfO2, Gd2O3 and PrOx by Liquid Injection ALD Techniques
RJ Potter, PR Chalker, TD Manning, HC Aspinall, YF Loo, AC Jones, ...
Chemical vapor deposition 11 (3), 159-169, 2005
1182005
Dielectric relaxation of high-k oxides
C Zhao, CZ Zhao, M Werner, S Taylor, P Chalker
Nanoscale research letters 8, 1-12, 2013
1162013
Aluminium accumulation in relation to senile plaque and neurofibrillary tangle formation in the brains of patients with renal failure
JM Candy, FK McArthur, AE Oakley, GA Taylor, CPLH Chen, SA Mountfort, ...
Journal of the neurological sciences 107 (2), 210-218, 1992
1161992
Charge transport in heavily B‐doped polycrystalline diamond films
M Werner, O Dorsch, HU Baerwind, E Obermeier, L Haase, W Seifert, ...
Applied physics letters 64 (5), 595-597, 1994
1111994
Electrochemistry at boron-doped diamond films grown on graphite substrates: redox-, adsorption and deposition processes
CH Goeting, F Jones, JS Foord, JC Eklund, F Marken, RG Compton, ...
Journal of Electroanalytical Chemistry 442 (1-2), 207-216, 1998
1091998
Silver ink formulations for sinter-free printing of conductive films
K Black, J Singh, D Mehta, S Sung, CJ Sutcliffe, PR Chalker
Scientific reports 6 (1), 20814, 2016
1072016
MOCVD and ALD of High‐k Dielectric Oxides Using Alkoxide Precursors
AC Jones, HC Aspinall, PR Chalker, RJ Potter, TD Manning, YF Loo, ...
Chemical Vapor Deposition 12 (2‐3), 83-98, 2006
972006
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