| New development of atomic layer deposition: processes, methods and applications PO Oviroh, R Akbarzadeh, D Pan, RAM Coetzee, TC Jen Science and technology of advanced materials 20 (1), 465-496, 2019 | 413 | 2019 |
| On the physical and chemical details of alumina atomic layer deposition: A combined experimental and numerical approach D Pan, L Ma, Y Xie, TC Jen, C Yuan Journal of Vacuum Science & Technology A 33 (2), 2015 | 66 | 2015 |
| Effects of gap size, temperature and pumping pressure on the fluid dynamics and chemical kinetics of in-line spatial atomic layer deposition of Al2O3 D Pan, TC Jen, C Yuan International Journal of Heat and Mass Transfer 96, 189-198, 2016 | 47 | 2016 |
| Numerical modeling of carrier gas flow in atomic layer deposition vacuum reactor: A comparative study of lattice Boltzmann models D Pan, T Li, T Chien Jen, C Yuan Journal of Vacuum Science & Technology A 32 (1), 2014 | 40 | 2014 |
| Atomic layer deposition of alumina coatings onto SnS2 for lithium-ion battery applications D Guan, L Ma, D Pan, J Li, X Gao, Y Xie, M Qiu, C Yuan Electrochimica Acta 242, 117-124, 2017 | 38 | 2017 |
| Atomic layer deposition process modeling and experimental investigation for sustainable manufacturing of nano thin films D Pan, D Guan, TC Jen, C Yuan Journal of Manufacturing Science and Engineering 138 (10), 101010, 2016 | 34 | 2016 |
| Experimental and numerical investigations into the transient multi-wafer batch atomic layer deposition process with vertical and horizontal wafer arrangements D Pan, L Ma, Y Xie, F Wang, TC Jen, C Yuan International Journal of Heat and Mass Transfer 91, 416-427, 2015 | 31 | 2015 |
| Mechanistic modeling of atomic layer deposition of alumina process with detailed surface chemical kinetics Y Xie, L Ma, D Pan, C Yuan Chemical Engineering Journal 259, 213-220, 2015 | 30 | 2015 |
| Atomic layer deposition of Al2O3 process emissions L Ma, D Pan, Y Xie, C Yuan Rsc Advances 5 (17), 12824-12829, 2015 | 21 | 2015 |
| Density Functional Theory (DFT)-enhanced computational fluid dynamics modeling of substrate movement and chemical deposition process in spatial atomic layer deposition D Pan Chemical Engineering Science 234, 116447, 2021 | 15 | 2021 |
| Numerical study on the effectiveness of precursor isolation using N2 as gas barrier in spatial atomic layer deposition D Pan International Journal of Heat and Mass Transfer 144, 118642, 2019 | 15 | 2019 |
| Optimizing the process efficiency of atomic layer deposition of alumina for its sustainability improvement: a combined experimental and modeling study Y Xie, D Pan, L Ma, C Yuan Journal of Cleaner Production 133, 338-347, 2016 | 12 | 2016 |
| Experimental Study of Process Emissions From Atomic Layer Deposition of Al2O3 Under Various Temperatures and Purge Time L Ma, D Pan, Y Xie, F Wang, C Yuan Journal of Manufacturing Science and Engineering 139 (5), 051013, 2017 | 7 | 2017 |
Tien-Chien JenUniversity of Johannesburg, ASME Fellow, ASSAf Fellow, SARChI ChairVerified email at uj.ac.za
